Comparison ledger
ABM -407B-1-S-CES293 Robot, KLA RS 55 Auto Resistivity Mapper, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | ABM | KLA |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-1-S-CES293 Robot | KLA RS 55 Auto Resistivity Mapper |
| Cited variants | — |
|
| Specifications | ||
| Model | ABM-407B-1-S-CES293[2] | RS 55 Auto[4] |
| Description | ROBOT[2] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[2] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[2] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[2] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[2] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[2] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[2] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[2] | — |
| Equipment type | — | Four-point probe resistivity mapping system[1] |
| Configuration | — | RS55/TC temperature compensation configuration[1] |
| Wafer size | — | Up to 8"/200 mm wafers[1] |
| Wafer handling | — | Manual wafer handling[1] |
| Measurement outputs | — | Contour maps, 3-D plots and diameter scans[1] |
| Temperature compensation | — | Can compensate sheet resistance measurements against ambient temperature and materials[1] |
| Power | — | 115V, 50/60 Hz[1] |
| Measurement capability | — | Surface resistivity measurement[3] |
| Software | — | Omni-Map Rev. 6.51 software with StatTrax[3] |
| Sample size | — | 8"-wafer or below[3] |
| Data storage | — | 2 GB Iomega Drive extra data storage[3] |
| Calibrated range | — | 0.005 Ω to 5 MΩ, NIST traceable[3] |
| Probe head | — | One probe head with desired range included[3] |
| Type | — | Four-point probe resistivity mapping system[1] |
| Outputs | — | Contour maps, 3-D plots, and diameter scans[1] |
| Measurement compensation | — | Can compensate sheet resistance measurements against ambient temperature and materials[1] |
| Measurement range | — | Calibrated (and NIST traceable) range from 0.005Ω to 5MΩ[3] |
| System type | — | Four-point-probe resistivity mapping system[1] |
| Measurement | — | Surface resistivity measurement[3] |
| Probe heads | — | One probe head with desired range included[3] |