Comparison ledger
ABM -407B-2-S-CE-S293 Robot, Applied Materials MxP+ Poly, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MxP+ PolyApplied Materials | |
|---|---|---|
| OEM | ABM | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-2-S-CE-S293 Robot | Applied Materials MxP+ Poly |
| Cited variants | — |
|
| Specifications | ||
| Model | ABM-407B-2-S-CE-S293[2] | — |
| Description | ROBOT[2] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[2] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[2] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[2] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[2] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[2] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[2] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[2] | — |
| Wafer Size | — | 200mm[3] |
| Platform | — | Centura 5200[3] |
| Process Type | — | Polysilicon Etch[3] |
| Date of Manufacture | — | 1998[3] |
| Software Version | — | 4.9_15[3] |
| Orienter Quantity | — | 1[3] |
| MxP Poly Quantity | — | 1[3] |
| MxP+ Poly Quantity | — | 2[3] |
| eMxP+ ESC Quantity | — | 1[3] |
| End Point Detection | — | Monochromator[3] |
| Gases Used | — | NF3, CH3F, CL2, HBR, CHF3, AR, CF4, O2, N2, C4F8, CO, HE/O2[3] |
| MFCs | — | 32 Digital MFC's[3] |
| Robot | — | HP Robot[3] |
| Dry Pumps | — | 4-IQDP80, 2-IQDP80/WSU151[3] |
| Chillers | — | 5-Neslab-150[3] |
| Wafer Size (Asseta) | — | 6"[1] |
| ESC Type | — | Polymide[3] |