Comparison ledger
ABM -407B-2-S-CE-S293 Robot, GCA 3696, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 3696GCA | |
|---|---|---|
| OEM | ABM | GCA |
| Category | — | — |
| Wafer size | — | 150mm |
| Process node | — | legacy semiconductor lithography equipment |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | g-line |
| Family | ABM -407B-2-S-CE-S293 Robot | GCA 3696 |
| Cited variants | — |
|
| Specifications | ||
| Model | ABM-407B-2-S-CE-S293[2] | — |
| Description | ROBOT[2] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[2] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[2] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[2] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[2] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[2] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[2] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[2] | — |
| Instrument type | — | Photorepeater system[1] |
| Conversion note | — | Can be easily converted to function as a GCA 3696 Photorepeater system[1] |
| Exposure target | — | Photoresist-coated glass plates[1] |
| Maximum plate size | — | Up to 7"[1] |
| Wafer size | — | 3" up to 150mm; smaller pieces[1] |
| Exposure wavelength | — | g-line (436nm)[1] |
| Numerical aperture | — | 0.30 N.A.[1] |
| Reduction | — | 5:1 reduction[1] |
| Field size | — | Variable field size up to 15mm square[1] |
| Minimum feature size | — | <0.9µm[1] |
| Registered alignment | — | Typically <0.25µm[1] |
| Mask size | — | 5" x 0.090"-thick masks[1] |
| Stage motion | — | Laser-controlled stage motion[1] |
| Type | — | Step-and-repeat camera (stepper)[3] |
| Lens | — | Zeiss lens with 0.30 numerical aperture[1] |
| Resolution | — | 0.9 µm[1] |
| Reduction ratio | — | 5:1[1] |
| Control computer | — | DEC PDP-11/04[3] |
| Interface chassis | — | 9280 Interface Chassis[3] |