Comparison ledger
ABM -407B-2-S-CE-S293 Robot, Hitachi Z-5310, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Z-5310Hitachi | |
|---|---|---|
| OEM | ABM | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-2-S-CE-S293 Robot | Hitachi Z-5310 |
| Specifications | ||
| Model | ABM-407B-2-S-CE-S293[1] | — |
| Description | ROBOT[1] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[1] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[1] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[1] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[1] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[1] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[1] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[1] | — |
| Insp | — | spectrophotometer/flame[2] |
| Optical system | — | Polarized Zeeman correction (DC magnetic field)[3] |
| Spectroscope | — | Czerny-Turner mount[3] |
| Burner | — | Premix type (titanium)[3] |
| Atomization | — | Flame method (standard)[3] |
| Wavelength range | — | 190 to 900 nm[3] |
| Light source | — | Hollow cathode lamp (multi-element lamp turret)[4] |
| Detector | — | High-sensitivity photomultiplier tube[4] |
| Flame composition | — | Air-acetylene flame, nitrous oxide-acetylene flame (requires switching)[4] |
| Photometry | — | Double-beam (D2 background correction), single-beam (Zeeman)[4] |