Comparison ledger
Agilent E 500, Axcelis 200 PCU, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | E 500Agilent | 200 PCUAxcelis |
|---|---|---|
| OEM | Agilent | Axcelis |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2000 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent E 500 | Axcelis NV GSD 200 |
| Cited variants |
| |
| Specifications | ||
| Configuration | Medium Current[4] | — |
| Manufacturer | Agilent[5] | — |
| Category | Ion Implantation[5] | — |
| Wafer size | 8 inch[4] | — |
| Type | Medium current ion implanter[5] | — |
| Vintage | 1996 vintage[4] | — |
| P/N | — | SC 4840 A[6] |
| Frequency | — | 50 Hz[6] |
| Phase | — | 3 Phase[6] |
| Voltage | — | 400 V[6] |
Plan your fab
Building a Ion Implantation process? Get a complete equipment list.
Open the fab equipment planner →