Comparison ledger
AJA ATC 2200, Applied Materials 0010-13622 RF Match for, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ATC 2200AJA | 0010-13622 RF Match forApplied Materials |
|---|---|---|
| OEM | AJA | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | 6" | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | AJA ATC 2200 | Applied Materials 0010-13622 RF Match for |
| Specifications | ||
| Tool type | PVD tool; UHV sputtering system[1] | — |
| Sputtering sources | 330-XP (UHV) magnetron sputtering sources in con-focal orientation[1] | — |
| Source shutters | Pneumatic source shutters[1] | — |
| Gas injection | Integral gas injection to source head for reactive sputtering and low pressure operation[1] | — |
| Tilt adjustment | In-situ tilt gimbals with locking UHV position indicator; allows source head angle adjustment without breaking vacuum[1] | — |
| Viewports | 6" CF viewports[1] | — |
| Substrate size | To 6"[1] | — |
| Heating | Radiant heating to 800 C with quartz halogen lamps[1] | — |
| Power sources | DC and RF generators[1] | — |
| Ion source | Kaufman KDC 40 4cm gridded ion source[1] | — |
| Control system | Phase II-J Computer Control System[1] | — |
| Process type | PVD sputtering system[1] | — |
| Magnetron sources | 330-XP (UHV) magnetron sputtering sources in confocal orientation[1] | — |
| Reactive sputtering gas injection | Integral gas injection to source head for reactive sputtering and low pressure operation[1] | — |
| Source head adjustment | In-situ tilt gimbals with locking UHV position indicator[1] | — |
| Viewport size | 6" CF viewports[1] | — |
| Power supplies | DC and RF generators[1] | — |
| Configuration | — | High Efficiency HE RF Match-Bias[2] |
| Model | — | 0010-13622[2] |
| Product Type | — | RF Match for PVD (Physical Vapor Deposition)[2] |
| Feature | — | High Efficiency HE RF Match-Bias[2] |
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