Waferpedia

Comparison ledger

0010-03254 E ChuckversusStratosphere Plasma Treatment

Applied Materials 0010-03254 E Chuck, Nordson Stratosphere Plasma Treatment, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
OEMApplied MaterialsNordson
Category——
Wafer size—Wafer kit sensor
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Nordson Stratosphere Plasma Treatment
Specifications
Configuration—E-FEM, 300mm FOUP (2), ESD[1]
Wafer size—Wafer kit sensor[1]
Manufacturer—Nordson[1]
Model—Stratosphere[1]
Tool family—Nordson Stratosphere Plasma Treatment[2]
Equipment type—Plasma Treatment System[1]
Process type—Parallel plate asher[1]
RF power range—600 to 1000 W[1]
Chiller—Assy, Chiller, 1HP, 230V/60, 1/4"[1]
Vacuum—16 CFM standard dry pump[1]
Gas delivery—100 sccm MFC[1]
Wafer handling—Wafer kit sensor[3]
Wafer size kit—Wafer kit, 200/300mm hybrid[1]
Electrode water cooling—Included[1]
Electrode temperature sensor—F 3 electrode temperature sensor[1]
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com