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Comparison ledger

0010-03485 Magnet AssyversusTwinscan AT 850 D

Applied Materials 0010-03485 Magnet Assy, ASML Twinscan AT 850 D, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsASML
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyASML Twinscan AT 850
Cited variants—
  • ASML Twinscan AT 850 D - Laser: Cymer ELS 7600 - With Tel Lithius Track[1]
  • ASML Twinscan AT 850 D - 50/60 Hz - Laser: Cymer ELS 6610 - With Tel Lithius Track[2]
Specifications
ConfigurationWP AL 300mm PVD[3]With Tel Lithius Track[1]
OEMApplied Materials[3]—
Model0010-03485[3]Twinscan AT 850 D[1]
DescriptionMAGNET ASSY, WP AL 300MM PVD[4]—
ProcessPVD[5]—
Wafer size300mm[6]—
VersionSpares[6]—
Part Number0010-03485[3]—
ManufacturerApplied Materials[3]—
Process TypePVD (Physical Vapor Deposition)[3]—
Application (Material)Aluminum (AL)[3]—
Wafer Diameter (associated)300 mm[3]—
Laser—Cymer ELS 7600[1]
Track—Tel Lithius Track[1]
Power Frequency—50/60 Hz[2]
Make—ASML[1]
Mains frequency—50/60 Hz[2]
Associated track—TEL Lithius Track[1]
Sources (6)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]inventory listing
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]layla-ec.comlayla-ec.com
  6. [6]fabsurplus.comfabsurplus.com