Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Cascade Microtech EPS150TRIAX, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | EPS150TRIAXCascade Microtech |
|---|---|---|
| OEM | Applied Materials | Cascade Microtech |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Cascade Microtech EPS150TRIAX |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | Cascade MicroTech[5] |
| Model | 0010-03485[1] | EPS150TRIAX[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Equipment type | — | Probe Station[5] |
| Enclosure | — | Light shield enclosure[5] |
| Measured quantities | — | Current, voltage, resistance, capacitance, conductance[5] |
| Capacitance and conductance measurement range | — | 20 Hz to 1 MHz[5] |
| Applications | — | I-V characterization; low current measurements; C-V characterization (at multiple frequencies); resistance and conductance measurements; sheet resistance and resistivity measurements of substrates and deposited films[5] |
| Microscope | — | Trinocular 6.7x stereo zoom microscope with 100x magnification[5] |
| Motion axes | — | Micropositioner movement in x, y, and z[5] |