Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Lam Research Gasonics L 3510 Asher / Stripper, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Gasonics L 3510 Asher / StripperLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Lam Research Gasonics L 3510 Asher / Stripper |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | Downstream microwave plasma ashing[6] |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Microwave Power | — | 0–1200 W at 2.45 GHz[5] |
| Pressure Range | — | 0.5 to >5.0 torr[5] |
| Platen Temperature | — | 100–300°C[5] |
| Ash Rate | — | Up to 3.5 µm/min[5] |
| Throughput | — | 45–60 WPH[5] |
| Within Wafer Uniformity | — | ±5% to 10%[5] |
| Wafer-to-Wafer Uniformity | — | ±5% to 10%[5] |
| Process Gas | — | O2, N2[5] |
| Wafer Size Support | — | 75 mm to 200 mm (3 to 8 inch)[6] |
| Endpint Detection | — | Yes, typical[6] |
| Heating | — | Platen and lampe heating[5] |