Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Nova 3090, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | 3090Nova |
|---|---|---|
| OEM | Applied Materials | Nova |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Nova 3090 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | Nova[5] |
| Model | 0010-03485[1] | 3090[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | 300 mm[6] |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Category | — | CMP metrology system[6] |
| Channel | — | single polarized channel[6] |
| Spectral range | — | Deep-UV to Near-IR[6] |
| Applications | — | Poly, STI, Tungsten plugs, Copper interconnect[6] |
| Measurement capabilities | — | solid areas, 2D structures, 3D shape characterization, thickness and shape of dielectric materials, low-K materials[6] |
| Process capability | — | high-end 65nm and 45nm CMP applications[6] |