Comparison ledger
Applied Materials 0010-03485 Magnet Assy, SCREEN 3100, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | 3100SCREEN |
|---|---|---|
| OEM | Applied Materials | SCREEN |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | SCREEN 3100 |
| Cited variants | — | |
| Specifications | ||
| Configuration | WP AL 300mm PVD[3] | — |
| OEM | Applied Materials[3] | — |
| Model | 0010-03485[3] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[4] | — |
| Process | PVD[5] | — |
| Wafer size | 300mm[6] | — |
| Version | Spares[6] | — |
| Part Number | 0010-03485[3] | — |
| Manufacturer | Applied Materials[3] | — |
| Process Type | PVD (Physical Vapor Deposition)[3] | — |
| Application (Material) | Aluminum (AL)[3] | — |
| Wafer Diameter (associated) | 300 mm[3] | — |
| Throughput | — | 1,000 wafers per hour[1] |
| Number of modules | — | seven independent modules[1] |
| Module configuration | — | dual cleaning baths built into a single compact module[1] |
| Drying system | — | Low Pressure Drying System (HiLPD)[1] |
| Drying method | — | high concentration IPA vapor without carrier N2 gas[1] |