Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Tokyo Electron Unity 85 DS, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Unity 85 DSTokyo Electron |
|---|---|---|
| OEM | Applied Materials | Tokyo Electron |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Tokyo Electron Unity |
| Cited variants | — |
|
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | 2 chamber[1] |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | Unity 85 DS (U 2 S 855 II)[1] |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | Oxide etch with end point[1] |
| Wafer size | 300mm[5] | — |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | Tokyo Electron[6] |
| Process Type | PVD (Physical Vapor Deposition)[2] | — |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| Gas | — | C4F8, O2, Ar[1] |
| OS | — | Lynx[6] |
| Vacuum / pumping | — | 3ea pumps[6] |
| Gas delivery | — | C4F8, O2, Ar[6] |