Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Varian 23EX, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | 23EXVarian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Varian 23EX |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Power Source | — | Klystron[5] |
| Photon Energy Configuration | — | 6 & 10/15/18/25 MV[5] |
| Max Dose Rate Photons | — | 600 MU/min[5] |
| Electron Energies | — | Yes[5] |
| Max Dose Rate Electrons | — | 1000 MU/min[5] |
| Multi-Leaf Collimator (MLC) | — | 80-leaf (field size 40x40 cm); optional 120-leaf (central 20 cm: 5 mm leaf width, outer 20 cm: 10 mm leaf width)[5] |
| Portal Imager (EPID) | — | LC250, aS500, aS1000 (optional)[5] |
| KV Imaging for IGRT | — | OBI (optional)[5] |
| Cone-Beam CT | — | Only with OBI[5] |
| VMAT | — | Only with OBI[5] |
| Treatment Couch | — | Exact ETR, Exact (optional)[5] |