Comparison ledger
Applied Materials 0010-13622 RF Match for, Denton Vacuum Desk II Desktop, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Desk II DesktopDenton Vacuum |
|---|---|---|
| OEM | Applied Materials | Denton Vacuum |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Denton Vacuum Desk |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Metal Deposition[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Tool type | — | Desktop sputtering unit[2] |
| Application | — | Metal deposition[2] |
| Category | — | Deposition[3] |
| Utility requirements | — | 120 VAC, 10 A[4] |
| Process gas | — | Argon (UHP-Plus grade; 99.9993% pure)[4] |
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