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0010-13622 RF Match forversusConcept Two Sequel

Applied Materials 0010-13622 RF Match for, Lam Research Concept Two Sequel, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
Concept Two SequelLam Research
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forLam Research Concept Two
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]Thin Film[2]
Model0010-13622[1]Concept Two Sequel[2]
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Software Version—4.92 B 15[2]
CIM—SECS[2]
Process—SRO MIM[2]
Factory Interface—SMIF (2)[2]
QNX OS Version—4.23 A[2]
Chamber Type—A (C2-CV0D-S) / B (C2-CVDD-S)[2]
SMIF—LPI 2200[2]
Input & Output Controller—IOC O, IOC2, IOC3[2]
TV Controller—Millipore[2]
Loadlock Slit Valve Actuator—SMC[2]
Loadlock Indexer Controller—Animatics CC Model CDP 2407 2[2]
Wafer Size—8 inch[2]
Chamber Type A—C2-CV0D-S[2]
Chamber Type B—C2-CVDD-S[2]
Operating System—QNX OS Version 4.23 A[2]
CIM Interface—SECS[2]
SMIF Load Port—LPI 2200[2]
Cool Station Count—4[2]
Transfer Module Robot—Mag 7[2]
Vintage Year—2000[2]
OEM—Lam / Novellus[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing