Comparison ledger
Applied Materials 0010-13622 RF Match for, Lam Research Concept Two Triple Speed, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Concept Two Triple SpeedLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Deposition | Deposition |
| Wafer size | — | Entegris FA 200-85 MT 7902 Wafer Cassette |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Lam Research Concept Two Triple Speed |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | DLCM[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Wafer Substrate | — | Silicon[2] |
| Software | — | Speed Next 5.502 B22[2] |
| Cable length | — | 75 ft[2] |
| Wafer size | — | Entegris FA 200-85 MT 7902 Wafer Cassette[2] |
| Front End Option | — | SMIF Ready[2] |
| User Interface Options | — | Cleanroom (Right Side)[2] |
| Paddle & Arc Kits | — | STD[2] |
| Cool Station Options | — | MPS (Multi PEC Station)[2] |
| Particle Check Options | — | Particle Sensor Manifold[2] |
| Manometers | — | Heated[2] |
| Pressure Control | — | MKS[2] |
| Facilities Kit | — | Bottom[2] |
| Light Towers | — | 3 Lights - RYG[2] |
| Light Towering Mounting | — | Staff Mount[2] |
| TM Cover Options | — | STD Cover[2] |
| MPD | — | Triple[2] |
| Wafer Size | — | 8 inch[2] |
| Cable Length | — | 75 ft DLCM[2] |
| Wafer Cassette | — | Entegris FA 200-85 MT 7902[2] |
| Active Wafer Centering | — | Yes[2] |
| Light Tower Mounting | — | Staff Mount[2] |
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