Waferpedia

Comparison ledger

0010-13627 High Efficiency RF MatchversusPRC 012 AS Dry

Applied Materials 0010-13627 High Efficiency RF Match, Ulvac PRC 012 AS Dry, side by side. Every value shown is drawn from the cited encyclopedia entries.

LinkedIn X Email
Side-by-side comparison of selected equipment models
Attribute
0010-13627 High Efficiency RF MatchApplied Materials
PRC 012 AS DryUlvac
OEMApplied MaterialsUlvac
CategoryLab & Support EquipmentLab & Support Equipment
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13627 High Efficiency RF MatchUlvac PRC 012 AS Dry
Specifications
ConfigurationHE, BIAS[1]with PDR 090 B[2]
Asset Number70430[1]—
TypeHigh Efficiency RF Match - HE, BIAS[1]—
Make—Ulvac[2]
Model—PRC 012 AS[2]
Equipment type—Dry Pump[2]
Condition—Parts machine[3]
0010-13627 High Efficiency RF Match entryPRC 012 AS Dry entryAsk about these tools →Share experience with this comparison →

Plan your fab

Building a Lab & Support Equipment process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com