Comparison ledger
Applied Materials 0010-14300 Magnet Assy, Varian E 500 High Current, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-14300 Magnet AssyApplied Materials | E 500 High CurrentVarian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-14300 Magnet Assy | Varian E 500 High Current |
| Specifications | ||
| Configuration | P4 Magnet Assy, IMP[1] | System Vacuum:[2] |
| Gearbox P/N | 0010-27417[1] | — |
| Part Number | 0010-14300[1] | — |
| Description | P4 Magnet Assy, IMP[1] | — |
| Signal Tower | — | Front (Red, yellow, green)[2] |
| Production Wafer Qty' | — | 1 wafer (single platen)[2] |
| Platen Type | — | Electrostatic Clamp[2] |
| Loadloack | — | Left/Right 2 Chambers[2] |
| S/w version | — | 13.30 Rev C[2] |
| Implant Monitor | — | LCD Touchscreen[2] |
| Service Monitor | — | LCD Touchscreen[2] |
| Ion Source Chambe | — | CCIG/Torr[2] |
| Beamline Chamber | — | CCIG/Torr[2] |
| End Station Chamber | — | CCIG/Torr[2] |
| Source Dry Punp | — | iQDP 80[2] |
| Stage Pump | — | iQDP 80+QMB 500[2] |
| Loadlock Rough Pump | — | iQDP 80[2] |
| Loadlock Turbo Pump | — | CT 4 L & CT 4 R: P/N: 8108998G001 & 8108999G001[2] |
| Process Chamber | — | CT 250 P/N: 8039113[2] |
| Source Turbo Pump | — | Pfeiffer TPH 1201 P / P/N: PMP 03702[2] |
| Resolver Turbo Pump | — | Pfeiffer HiPace 300[2] |
| Beamline Turbo Pump | — | Pfeiffer HiPace 700Gas Box Upgrade:[2] |
Plan your fab
Building a Ion Implantation process? Get a complete equipment list.
Open the fab equipment planner →