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Comparison ledger

0010-16392 ESC Assemblyversus2300 Selis

Applied Materials 0010-16392 ESC Assembly, Lam Research 2300 Selis, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
2300 SelisLam Research
OEMApplied MaterialsLam Research
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyLam Research 2300 Selis
Cited variants—
  • 2300 SELIS - Chamber Only[1]
Specifications
OEMApplied Materials[2]—
Model0010-16392[2]2300 Selis[4]
TypeESC Assembly[2]—
Wafer Size300 mm[3]—
Electrode ConfigurationDual[3]—
OEM / manufacturer—Lam Research[4]
Equipment type—Etch chamber[4]
Category—Etch[5]
Wafer size—12 inch[4]
Process / description—Dielectric Etch – Process Chamber[1]
Configuration—Chamber Only[1]
Version—300 mm[1]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]fabsurplus.comfabsurplus.com
  2. [2]Equipment inventory listing
  3. [3]spwindustrial.comspwindustrial.com
  4. [4]Equipment inventory listing
  5. [5]waferpedia.comwaferpedia.com