Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Onto Innovation Nanospec 9200 Automated Film Analysis, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | Nanospec 9200 Automated Film AnalysisOnto Innovation |
|---|---|---|
| OEM | Applied Materials | Onto Innovation |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Onto Innovation Nanospec 9200 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Configuration | — | The controller was refurbished / installed, however the H-axis does not move[3] |
| Throughput | — | over 200 wafers per hour[4] |
| Spectral Range | — | 400-800nm or 190-760nm[4] |
| Footprint | — | smallest on the market, less than half the fab space of comparable units[4] |
| SEMI Standard Compliance | — | E95-0200 (Human Interface Standard for Semiconductor Manufacturing Equipment)[4] |