Comparison ledger
Applied Materials 0010 47763, Lam Research Kiyo 45, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Kiyo 45Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research Kiyo |
| Specifications | ||
| Configuration | 2nd Source New[1] | 2 Chamber + 1 Strip[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | — |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Loadport | — | Brooks 799-701175-005[4] |
| ATM Robot | — | Brooks P/N 138150[4] |
| TM Robot | — | Brooks P/N 201600-01[4] |
| MKS E28B-30200 Process Vacuum Gauge | — | 0.1 Torr[4] |
| MKS 625A-14059 Chamber Vacuum Gauge | — | 1 Torr[4] |
| MKS D24B12TCECB0 Micro Wave Vacuum Gauge | — | 100 Tor[4] |
| Chamber configuration | — | 2 Chamber + 1 Strip[4] |
| Process Vacuum Gauge | — | MKS E28B-30200, 0.1 Torr[4] |
| Chamber Vacuum Gauge | — | MKS 625A-14059, 1 Torr[4] |
| Micro Wave Vacuum Gauge | — | MKS D24B12TCECB0, 100 Torr[4] |
| Air Lock Heating Gauge | — | Teledyne HPM-2002-OBE-LM[4] |
| Turbo Pump | — | Edwards SCU 1500[4] |
| Turbo Pump Controller | — | Edwards SCU 1600[4] |
| Bias RF Generator | — | Lam 3156110-214[4] |
| TCP RF Generator | — | Lam 3156110-313[4] |
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