Comparison ledger
Applied Materials 0010 47763, Lam Research Rainbow 4526 XL, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Rainbow 4526 XLLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research Rainbow 4526 |
| Specifications | ||
| Configuration | 2nd Source New[1] | Oxide Etch[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | Rainbow 4526 XL[4] |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Wafer type | — | Jeida flat[4] |
| Valve type | — | VAT 65[4] |
| Software | — | Envision 1.6.1-005[4] |
| RF | — | ENI-GHW50 / ENI-2MHz[4] |
| Robot | — | Harmonic Drive[4] |
| Loader | — | Hine Indexers 38A[4] |
| Loadlock | — | Entrance & Exit LL[4] |
| Turbo Pump | — | HGP Pump[4] |
| Controllers | — | HGP / VAT 65[4] |
| Manufacturer | — | Lam Research[4] |
| Category | — | Etch[5] |
| Tool type | — | Plasma etcher[4] |
| Process | — | Oxide etch[4] |
| Wafer sizes | — | 6 inch, 8 inch[4] |
| ESC | — | Present[4] |
| Endpoint | — | Monochromator Endpoint[4] |
| RF cart | — | Present[4] |
| Gas chamber | — | Present[4] |
| Ar | — | 485.0 sccm[4] |
| CF4 | — | 20.0 sccm[4] |
| CHF3 | — | 20.0 sccm[4] |
| C4F8 | — | 19.5 sccm[4] |
| CO | — | 200.0 sccm[4] |
| O2 LOW | — | 20.0 sccm[4] |
| O2 HIGH | — | 1000.0 sccm[4] |
| N2 | — | 100.0 sccm[4] |
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