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Comparison ledger

0020 18698 PartversusPlasmalab 800 Plus

Applied Materials 0020 18698 Part, Oxford Instruments Plasmalab 800 Plus, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18698 PartApplied Materials
Plasmalab 800 PlusOxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18698 PartOxford Instruments Plasmalab 800
Specifications
ConfigurationDial Cover, Side Local Match, Hdpcvd, Ul[1]Nitride[2]
Voltage—208 V[3]
Frequency—60 Hz[3]
Phase—3+ Neutral / earth[3]
Type—PECVD (plasma-enhanced chemical vapor deposition) system[3]
Process—Chemical vapor deposition[2]
Configuration / option—Nitride[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com