Waferpedia

Comparison ledger

0020 23839 Partversus3118

Applied Materials 0020 23839 Part, Varian 3118, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 23839 PartApplied Materials
3118Varian
OEMApplied MaterialsVarian
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 23839 PartVarian 3118
Cited variants—
  • 3118 10 E E-Beam[1]
Specifications
ConfigurationPlate, Sensor Clamp, Hdpcvd Ultima +[2]—
System Type—Electron beam evaporator thin film deposition system[3]
OEM—Varian[3]
Model—3118[3]
High Voltage Power Supply—Edwards Temescal CV-GSLX[3]
Beam Controller—Temescal beam controller with remote[3]
Heater Power Supplies—CHA heater power supplies[3]
SCR Power Supplies—Varian SCR power supplies[3]
Vacuum Pump—Pfeiffer Adixen ACP 28 dry vacuum pump (not included)[3]
Cryogenic Pumping—CTI Cryogenics cryo compressor[3]
Chiller—Neslab ThermoFlex 2500 (not included)[3]
Substrate Configuration—Slot rotating substrate holder with planetary shields[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com