Comparison ledger
Applied Materials 0041-39086 ESC Part, Lam Research 590, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0041-39086 ESC PartApplied Materials | 590Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Lam Research 590 |
| Specifications | ||
| Voltage | — | 208V[1] |
| Wafer size | — | 6 inch[1] |
| RF frequency | — | 13.56 MHz[3] |
| Pressure | — | 2.8 Torr[3] |
| Gap | — | 0.38 cm[3] |
| Power (low) | — | 450 W[3] |
| Power (high) | — | 850 W[3] |
| OEM | — | Lam Research[1] |
| Model | — | 590[1] |
| Category | — | Etcher[1] |
| Power | — | 208V[1] |
| Plasma recipe entry | — | CF4+CHF3+He (90:30:120 sccm)[3] |
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