Waferpedia

Comparison ledger

A 412 LPCVDversus0 V 500

ASM A 412 LPCVD, Blue M 0 V 500, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0 V 500Blue M
OEMASMBlue M
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyASM A 412 LPCVDBlue M 0 V 500
Cited variants—
Specifications
ConfigurationNITR[1]—
OEMASM[1]—
ModelA 412[1]—
Tool typeLPCVD furnace (Low Pressure Chemical Vapor Deposition)[1]—
Wafer size12 inch[1]—
Vintage2006[1]—
Equipment typeLPCVD Furnace (Low Pressure Chemical Vapor Deposition)[1]—

Plan your fab

Building a Thermal / Diffusion process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]inventory listing
  3. [3]inventory listing