Comparison ledger
ASM Epsilon 2000, Kurt Lesker ALD-150LX, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Epsilon 2000ASM | ALD-150LXKurt Lesker |
|---|---|---|
| OEM | ASM | Kurt Lesker |
| Category | Deposition | Deposition |
| Wafer size | 150mm | 150mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASM Epsilon | Kurt Lesker ALD-150LX |
| Specifications | ||
| Supply Voltage/ Freq | 480/ 50[1] | — |
| System Hand | Right Hand[1] | — |
| Monitor Type | Flat Panel[1] | — |
| Wafer Size | 150mm[1] | — |
| Maint Console | Mini Maint[1] | — |
| CPU | 68040[1] | — |
| Software Version | 7.65[1] | — |
| Comms | HSMS[1] | — |
| RP/ ATM | RP[1] | — |
| Vacuum Load Locks | No[1] | — |
| WHC Gate Valve | Swing[1] | — |
| WHC Robot Arm | Wide[1] | — |
| Reactor Isolation | HVA[1] | — |
| ATM Valve | VAT[1] | — |
| Pressure Controller | MKS 152 Analogue[1] | — |
| PCV Type | MKS 253B[1] | — |
| Choke Valve | Yes[1] | — |
| RP Orientation | Bottom Feed[1] | — |
| Gas Panel Orientation | Top Feed[1] | — |
| Main H2/N2 | 100slm[1] | — |
| Process type | CVD (Chemical Vapor Deposition)[1] | — |
| Wafer sizes supported | 150 mm and 200 mm wafers[3] | — |
| Tool type | single-wafer epitaxy tool[3] | — |
| Supply voltage/frequency | 480/50[1] | — |
| OEM | — | Kurt Lesker[4] |
| Model | — | ALD-150LX[4] |
| Load-locked | — | Yes[5] |
| In situ ellipsometer | — | Film Sense FS-1 Multi-Wavelength[5] |
| Available film growth by request | — | Al2O3, HfO2, ZrO2, HfZrO2, TiN, Ga2O3[5] |
| Maximum film thickness stated | — | up to 20 nm[5] |
| Substrate specification | — | No exposed organics such as polymers[5] |
| Small samples | — | Able to be clipped to wafer carrier[5] |
Plan your fab
Building a Deposition process? Get a complete equipment list.
Open the fab equipment planner →