Waferpedia

Comparison ledger

TWINSCAN NXE:3300versus017-0024-01 Prealigner

ASML TWINSCAN NXE:3300, Brooks 017-0024-01 Prealigner, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMASMLBrooks
CategoryLithographyLithography
Wafer size——
Process node——
Introduced2013—
Production run2013–—
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyASML TWINSCAN NXE:3300Brooks 017-0024-01 Prealigner
Specifications
TechnologyEUV lithography[1]—
Wavelength13.5 nm[1]—
Numerical Aperture0.33[1]—
Resolution13 nm[1]—
Light sourceCO2 laser on tin droplets[1]—

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (1)Every fact above is drawn from these public sources
  1. [1]asml.comasml.com