Waferpedia

Comparison ledger

TWINSCAN NXE:3600Dversus1000 Family

ASML TWINSCAN NXE:3600D, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1000 FamilyUltratech
OEMASMLUltratech
CategoryLithographyLithography
Wafer size——
Process node5 nm, 3 nm—
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyASML TWINSCAN NXE:3600DUltratech 1000 Family
Specifications
Wavelength13.5 nm[1]—
Numerical Aperture (NA)0.33[1]—
Resolution13 nm[1]—
Tool type—Photolithography step-and-repeat 1X stepper[2]
Optical design—Wynne Dyson[2]
Magnification—1X[2]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]asml.comasml.com
  2. [2]en.wikipedia.orgen.wikipedia.org