Comparison ledger
ASML Twinscan XT 1250 D, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | Continuous clampable wafer table for dry WSs: Absent | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML Twinscan XT 1250 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | with Cymer XLA165[1] | — |
| Track Pre-warning signal (APR)s | APR enabled[1] | — |
| Active wafer release for dry WSs | FALSE[1] | — |
| Wafer size | Continuous clampable wafer table for dry WSs: Absent[1] | — |
| Wafer Stage Configurations | Wafer Stage type 2 configuration[1] | — |
| Wafer Carrier Locations | Right[1] | — |
| Wafers per Carriers | 25[1] | — |
| Wafer Mark Sensors | Absent[1] | — |
| Wafer Id Readers | Absent[1] | — |
| Wafer Tracks | Present[1] | — |
| Wafer Stage Types | Dual Chuck[1] | — |
| Wafer Stress Relaxations | FALSE[1] | — |
| Lower Docking Plates | Present[1] | — |
| WS Balance Masss | Stainless Steel[1] | — |
| WH Robot Power Amplifiers | CPM 20[1] | — |
| Light source | Cymer XLA165[1] | — |
| Wafer stage type | Dual Chuck[1] | — |
| Wafer configuration | Dry[1] | — |
| Carrier handler type | Mark I 300 Foup[1] | — |
| Wafer handling load & unload robot type | Double Fold Arm, 12 mm Z stroke[1] | — |
| Reticle stage measurement system on scans | Heidenhain Encoders[1] | — |
| Reticle stage chuck type | Glued Leafspring, TYPE_2: Glued LS, Pneum. GC, IFM / ENC[1] | — |
| Integrated reticle inspection system | PPD1 with IRIS1 functionality[1] | — |
| Reticle size | 6 inch[1] | — |
| Wafers per carrier | 25[1] | — |
| Wafer stage balance mass | Stainless Steel[1] | — |
| Interferometer axis version at exposures | 3 plus 1 axis[1] | — |
| Universal Prealignments | Disabled[1] | — |
| Wafer Handling Pneumaticss | Dedicated[1] | — |
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