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200 PCU Photoresist StabilizerversusCEE 1100 Large Substrate and Wafer Hot Plate

Axcelis 200 PCU Photoresist Stabilizer, Brewer Science CEE 1100 Large Substrate and Wafer Hot Plate, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
200 PCU Photoresist StabilizerAxcelis
CEE 1100 Large Substrate and Wafer Hot PlateBrewer Science
OEMAxcelisBrewer Science
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
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Generation——
FamilyAxcelis NV GSD 200Brewer Science CEE
Specifications
Configuration14 Amps[1]Accommodates 8" wafers[3]
Voltage380 V[1]220 V, 2000 W[3]
Frequency50 Hz[1]—
Phase3 Phase[1]—
200 PCU Photoresist Stabilizer entryCEE 1100 Large Substrate and Wafer Hot Plate entryAsk about these tools →Share experience with this comparison →

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing