Waferpedia

Comparison ledger

200 PCUversusNV GSD VHE

Axcelis 200 PCU, Axcelis NV GSD VHE, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
200 PCUAxcelis
NV GSD VHEAxcelis
OEMAxcelisAxcelis
CategoryIon ImplantationIon Implantation
Wafer size—Wafer tilt
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones2000 Vintage—
Control system——
Generation——
FamilyAxcelis NV GSD 200Axcelis NV GSD VHE
Cited variants
  • Fusion 200 PCU[1]
  • Fusion 200 PCU-P[2]
—
Specifications
P/NSC 4840 A[3]—
Frequency50 Hz[3]—
Phase3 Phase[3]—
Voltage400 V[3]—
Wheel type—Full disk 17 wafers[4]
Wafer size—Wafer tilt[4]
Source—Bernas[4]
Extraction system—Triple axes[4]
Gases—Arsenic, Boron, Phosphine (SDS), all bottles removed. There is also present plumbing for one Xe bottle.[4]
Configuration—SDS Gas box[4]
Max implantation energy (in KeV)—4.2 MeV (14 resonator configuration).[4]
Max Extraction voltage (in KeV)—90[4]
Orienter type—flat[4]
Hydrogen implantation available—no[4]
PFS—HD[4]
Software version—5.6[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]exapro.comexapro.com
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]inventory listing