Comparison ledger
Brooks 017-0024-01 Prealigner, Canon FPA 3000 iW, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 017-0024-01 PrealignerBrooks | FPA 3000 iWCanon |
|---|---|---|
| OEM | Brooks | Canon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Brooks 017-0024-01 Prealigner | Canon FPA 3000 |
| Cited variants | — |
|
| Specifications | ||
| Voltage | — | 200V[2] |
| Configuration | — | 50/60 Hz[3] |
| Phase | — | 3 Phase[2] |
| Power | — | 29kVA[3] |
| Make | — | Canon[3] |
| Model | — | FPA 3000 iW[3] |
| Category | — | Lithography[2] |
| Equipment type | — | Stepter[3] |
| Frequency | — | 50/60 Hz[2] |
| Chamber | — | Rasco TBW-CD-83iW Compact Chamber[3] |
| Reticle size | — | 6" square t=0.25"[4] |
| Reticle material | — | Quartz[4] |
| Pattern material | — | 2 layer Cr, 3 layer Cr[4] |
| Pellicle frame | — | Pattern side only[4] |
| Wafer size | — | 4" thru 8" SEMI Standard, JEIDA, Notch / Flat[4] |
| Projection magnification | — | 1/2 X[4] |
| Numerical aperture | — | 0.24[4] |
| Field size | — | 50X50mm[4] |
| Exposure light | — | i-line (365nm)[4] |
| Light source | — | 2.0KW Super High Pressure Hg Lamp[4] |
| Intensity | — | 2500 W/m 2[4] |
| Uniformity | — | < 1.5%[4] |
| Resolution | — | <0.8µm[4] |
| Depth of focus | — | >4.0µm (0.8µm L&S)[4] |
| Image field deviation | — | <2.5µm[4] |
| Distortion | — | <±0.11µm[4] |
| Reticle rotation accuracy | — | <±0.02µm on wafer[4] |
| Reticle rotation repeatability | — | <0.05µm on wafer[4] |
| Wafer alignment | — | <0.10µm mean + 3sigma[4] |
| Focus repeatability | — | <0.10µm (3sigma)[4] |
| Leveling repeatability | — | <7ppm (3sigma)[4] |
| Minimum compensation range | — | >100ppm[4] |
| Step accuracy | — | <0.05µm (3sigma)[4] |
| Scaling | — | <±1.0ppm[4] |
| Orthogonality | — | <±1.0ppm[4] |
| Throughput | — | >120 wafers/hour Φ6", 50mm, 9 shots; >115 wafers/hour Φ8", 50mm, 14 shots[4] |
| Rasco chamber | — | TBW-CD-83iW Compact Chamber[3] |
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