Waferpedia

Comparison ledger

PV 614versus1000 Hot Plate

BTU PV 614, CEE 1000 Hot Plate, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMBTUCEE
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBTU PV 614CEE 1000 Hot Plate
Specifications
Heater typeIR Lamp[1]—
Belt width36 cm[1]—
Conveyor speed56-560 cm/min[1]—
Load station38 cm[1]—
Unload station38 cm[1]—
Number of heated zones6[1]—
Maximum temperature rating1000°C[1]—
Operating temperature range200-900°C[1]—
Forced air cooling length229 cm[1]—
AtmosphereCDA, typical 900 scfh / 25.2 m3/hr[1]—
Process exhaustVenturi Assist 2[1]—
Electrical400/230 VAC, 112 AMP, 81 KVA, 50/60 Hz[1]—
Overall length576 cm[1]—
Overall width96.5 cm[1]—
Overall height184 cm[1]—
Serial numberECN-1C[1]—
OEMBTU International[1]—
ModelPV 614[2]—
Equipment typeSolar firing furnace[1]—
Vintage2013[1]—
Configuration—4"[3]
Type—Hot Plate[3]
Wafer Size—4 inch[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]solutions-on-silicon.comsolutions-on-silicon.com
  2. [2]Equipment inventory listing
  3. [3]inventory listing