Comparison ledger
Canon 5500 iZA, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 5500 iZACanon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon 5500 iZA | SUSS MicroTec 150 e Mask |
| Cited variants |
| — |
| Specifications | ||
| Model type | i-Line (365nm) Stepper[2] | — |
| Wafer size | 300mm; 200mm[2] | — |
| Resolution | ≤0.35μm[2] | — |
| Numerical Aperture (NA) | 0.45 ~ 0.57[2] | — |
| Reticle size | 6in. (0.25in. thick)[2] | — |
| Reduction ratio | 4:1[2] | — |
| Field size | 26mm x 33mm[2] | — |
| Overlay accuracy | ≤ 16nm (M+3)[2] | — |
| Throughput | ≥93wph (300mm); ≥155wph (200mm)[2] | — |
| Exposure wavelength | i-line (365nm)[2] | — |
| Lamp | 4.5kW high-pressured mercury lamp[2] | — |
| Overlay accuracy achieved | 16nm through reticle magnification compensation and through improvements in Z and tilt compensation accuracy, stage environment control accuracy, and calibration accuracy[2] | — |
| Platform | FPA-5000 platform[2] | — |
| Manufacturer | Canon[3] | — |
| Model | 5500 iZA[3] | — |
| Tool type | i-line stepper lithography system[1] | — |
| Last confirmed date | August 22, 2023[3] | — |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →