Comparison ledger
Canon FPA 5500 iZa, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 5500 iZaCanon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 5500 iZa | SUSS MicroTec 150 e Mask |
| Cited variants |
| — |
| Specifications | ||
| Manufacturer | Canon[2] | — |
| Model | FPA 5500 iZa[2] | — |
| Category | Lithography[3] | — |
| Tool type | Stepper / Scanner[2] | — |
| Wafer size | 300mm[4] | — |
| Wafer chuck type | Pin chuck[4] | — |
| Projection lens magnification | 1:4[4] | — |
| NA | Variable (0.57~0.45 / 0.01 resolution)[4] | — |
| Exposure light | i Line (365nm)[4] | — |
| Light source | Ultra high-pressure mercury lamp[4] | — |
| Light source manufacturer/model | Ushio Inc. / SUV-4500CIL[4] | — |
| Reticle storage | 14ea (Standard), Nikon type 15ea (Total 29ea)[4] | — |
| Reticle barcode reader | 2D[4] | — |
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