Comparison ledger
CEE 200CBX, Laurell WS-65, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200CBXCEE | WS-65Laurell |
|---|---|---|
| OEM | CEE | Laurell |
| Category | spin coater | spin coater |
| Wafer size | 200mm | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | Windows | — |
| Generation | — | — |
| Family | CEE 200CBX | Laurell WS-65 |
| Specifications | ||
| OEM | Brewer Science[1] | — |
| Model | CEE 200CBX[2] | — |
| System type | precision coat-bake system[2] | — |
| Description | track-quality precision spin coater with a high-uniformity bake plate[2] | — |
| Control interface | Windows-based PC graphical user interface (GUI)[2] | — |
| Substrate size | up to 200mm round or 7 in. square[2] | — |
| Maximum spin speed | up to 6000 rpm[2] | — |
| Dispense method | hand dispensed using pipettes[2] | — |
| Usage description | photoresist spinner[2] | — |
| Spin speed | up to 6000 rpm[2] | — |
| Coating method | hand dispensed using pipettes[2] | — |
| Bake plate | high-uniformity bake plate[2] | — |
| Programmability | programs easily entered, monitored and stored[2] | — |
| Type | precision coat-bake system[2] | — |
| Equipment type | — | Spin coater[3] |
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