Comparison ledger
Hitachi CG 5000 CD-SEM, KLA .204 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | CG 5000 CD-SEMHitachi | |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | Automatic Beam Alignment on wafer | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi CG 5000 CD-SEM | KLA .204 PSL Wafer |
| Specifications | ||
| Configuration | Critical Dimension (CD) Measurement Scanning Electron Microscope (SEM)[1] | NIST Traceable[2] |
| Resolution | 1.45nm with signal processing function.[1] | — |
| Measurement repeatability | 0.25nm (3sig)[1] | — |
| Throughput | 50wph (20 measurements/wafer), approximately 40%[1] | — |
| Wafer size | Automatic Beam Alignment on wafer[1] | — |
| Wafer Size | — | 8 inch[2] |
| Traceability | — | NIST[3] |
| Compatible Tools | — | Surfscan 6xy0, Sp1[2] |
| NIST Traceable | — | Yes[2] |
Plan your fab
Building a Metrology & Inspection process? Get a complete equipment list.
Open the fab equipment planner →