Waferpedia

Comparison ledger

S 3700 NversusS 3700 N VP-SEM

Hitachi S 3700 N, Hitachi S 3700 N VP-SEM, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
S 3700 NHitachi
OEMHitachiHitachi
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHitachi S 3700 NHitachi S 3700 N
Specifications
ConfigurationLarge chamber[1]Detectors:[3]
TypeScanning Electron Microscope (SEM)[1]—
Wafer size12 inch[1]—
Observable areaup to 203 mm in diameter[1]—
Maximum sample height for observation and EDS analysisup to 110 mm tall[1]—
Analytical capabilitiesEDS, EBSD and WDS simultaneously available[1]—
Stage5-axis computer eucentric motorized stage with -20/+90* tilt[1]—
Operating modesOne-button selectable High Vacuum / Low Vacuum modes[1]—
SEM classUltra Large VP-SEM[2]—
EDS—Yes EDAX/ Model: Apollo XP[3]
Accessories—Carbon Coater (VC-100)[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]inventory listing