Comparison ledger
KLA 1.112 PSL Wafer, KLA 8100 XP CD-SEM, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | KLA 8100 |
| Cited variants | — | |
| Specifications | ||
| Configuration | NIST Traceable[2] | 50/60 Hz[4] |
| Wafer Size | 8 inch[2] | — |
| NIST Traceable | True[2] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[3] | — |
| Voltage | — | 102V[4] |
| Power Requirements | — | 50/60 Hz, 102V, 20 amps[4] |
| Throughput | — | Highest in the industry[1] |
| Operation | — | Fully automated cassette-to-cassette[1] |
| Measurement Capability | — | Bottom imaging of high aspect ratio structures[5] |
| Equipment type | — | Critical Dimension Scanning Electron Microscope (CD-SEM)[4] |
| Make | — | KLA[4] |
| Model | — | 8100 XP[4] |
| Power requirement | — | 50/60 Hz - 102V - 20 amps[4] |
| Vintage | — | 2001[4] |
| Automated measurement mode | — | fully automated cassette-to-cassette CD measurements[1] |
| Target materials | — | silicon wafers and reticles[1] |
| Imaging capability | — | bottom imaging of high aspect ratio structures[1] |
| Automation and networking | — | networking capability and automation[1] |
| Productivity claim | — | highest throughput in the industry[1] |
| Applications | — | metrology requirements for CD measurements and process control[5] |
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