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Comparison ledger

.496 PSL WaferversusMetaPulse 200 Film Thickness Measurement

KLA .496 PSL Wafer, Onto Innovation MetaPulse 200 Film Thickness Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMKLAOnto Innovation
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run—1998–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA .496 PSL WaferOnto Innovation MetaPulse 200
Specifications
ConfigurationNIST Traceable[1]4900 va[3]
Wafer size8 inch[1]8 inch[3]
TraceabilityNIST Traceable[1]—
Compatible systemsCapable on Surfscan 6xy0 and SP1[1]—
CategoryMetrology & Inspection[2]—
Voltage—220 VAC[4]
Maximum Single Load—5 amps at 220 VAC[4]
Wafer diameter—200 mm[5]
Phase—Single Phase[4]
Frequency—50/60 Hz[4]
Power/configuration—4900 va[3]
Floppy drives—16 Fla[3]
Process—Wafer Inspection[5]
Year of manufacture—1998[5]
Ultrafast laser—800 nm[5]
Pattern recognition—Included[5]
Controller—Programmable motion controller[5]
Computer platform—266 MHz Pentium II Motherboard[5]
Storage—2GB hard drive[5]
Optical drive—CD ROM drive[5]
Display—LCD screen[5]
Input devices—Keyboard and Trackball[5]
Interface—GEM compliant SECS-II[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com
  5. [5]rawbw.comrawbw.com