Comparison ledger
Lam Research Alliance A 6 TCP 9400 DFM Polysilicon, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Alliance A 6 TCP 9400 DFM PolysiliconLam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Alliance A 6 TCP 9400 DFM Polysilicon | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Wafer Size | 8 inch[1] | — |
| Voltage | 208 VAC[2] | — |
| Frequency | 50/60 Hz[2] | — |
| Full Load Current | 43 A[2] | — |
| Short Circuit Interrupting Capacity | 10 kA[2] | — |
| Main Circuit Breaker Rating | 50 A[2] | — |
| Software Version | A4.0-37VM[1] | — |
| ESC Material | Anodized Aluminum[1] | — |
| Interferometer EP | PM4[1] | — |
| Gas Box | Enhanced Universal (12 sticks)[1] | — |
| Pumps | Busch DS 80 Cobra, Busch BA 100 (2)[1] | — |
| Chillers | TCU Edwards 40/80 Plus, RPM Voltage SAG Enhanced[1] | — |
| Transport Module | TCP 9400 FM-P (Tungsten Silicide Etch)[1] | — |
| Software | A4.0-37VM[1] | — |
| PM4 | TCP 9400D FM-P, Wsix Etch[1] | — |
| ESC | Anodized Aluminum[1] | — |
| TCU | Edwards 40/80 Plus[1] | — |
| RPM | Voltage SAG Enhanced[1] | — |
| Main CB Current Rating | 50 A[2] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[3] |
| Cryo DRIE etch rate | — | up to 5 µm/min[3] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[3] |
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