Comparison ledger
Lam Research Exelan Dry, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Exelan DryLam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Exelan Dry | Oxford Instruments 100 ICP Fluorine |
| Cited variants | — | |
| Specifications | ||
| Wafer Size | 300mm[1] | — |
| Vintage (manufacturing year) | 2005[1] | — |
| Wafer Size (via version) | 200mm[3] | — |
| Vintage | 2004-06-01[2] | — |
| Manufacturer | Lam Research[4] | — |
| Model | Exelan Dry[4] | — |
| Tool type | dry etch chamber[5] | — |
| Vintage year | 2005[5] | — |
| Variant designation | V2 Exelan[5] | — |
| Variant wafer size | 200mm[5] | — |
| Variant vintage year | 2004[5] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[6] |
| Cryo DRIE etch rate | — | up to 5 µm/min[6] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[6] |
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