Comparison ledger
Lam Research SEZ SP 304, Tokyo Electron Expedius Plus, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SEZ SP 304Lam Research | Expedius PlusTokyo Electron |
|---|---|---|
| OEM | Lam Research | Tokyo Electron |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2007 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research SEZ | Tokyo Electron Expedius |
| Specifications | ||
| Configuration | Equipped With:[1] | Resistivity monitoring (Horiba)[4] |
| Manufacturer | Lam Research[2] | — |
| Model | SEZ SP 304[2] | Expedius Plus[4] |
| Tool type | Single wafer processing system[2] | — |
| Category | Wet Processing / Clean[3] | — |
| Wafer Size | 12 inch[2] | — |
| Application | — | Pre-Diffusion Clean[4] |
| Bath-1 | — | SPM[4] |
| Operating | — | 110 - 150°C, H2SO4/H2O2 (3:1), circulation[4] |
| Chemical spiking | — | auto concentration feedback[4] |
| Bath Material | — | Quartz[4] |
| Bath-2 | — | QDR (hot)[4] |
| Megasonic | — | 950 kHz, 2400W (600*4)[4] |
| Bath-3 | — | APM[4] |
| Bath-4 | — | POU[4] |
| Bath-5 | — | HPM[4] |
| Bath-6 | — | QDR (hot)[4] |
| Dryer | — | SD2[4] |
| OEM | — | Tokyo Electron[4] |
| Equipment type | — | Wet Bench[4] |
| Vintage | — | 2007[4] |
Plan your fab
Building a Wet Processing / Clean process? Get a complete equipment list.
Open the fab equipment planner →