Comparison ledger
Laurell EDC-HL-15, Laurell WS-650-15, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | EDC-HL-15Laurell | WS-650-15Laurell |
|---|---|---|
| OEM | Laurell | Laurell |
| Category | Spin coater | Spin coater |
| Wafer size | 300mm | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | 650-series | 650-series |
| Family | Laurell EDC-HL-15 | Laurell WS-650-15 |
| Cited variants | ||
| Specifications | ||
| Model | EDC-HL-15 B[1] | WS-650-15[2] |
| Series | 650-series EDC system[1] | — |
| Wafer/substrate capacity | Up to ø 300 mm wafers and 9" × 9" (229 mm × 229 mm) substrates[1] | — |
| Maximum speed capability | 12,000 RPM with vacuum hold-down[1] | — |
| Recommended speed | 3,000 RPM[1] | — |
| Recommended chuck type | Non-vacuum chucks[1] | — |
| Power | 95 to 240 VAC, 47/63 Hz, ~300 Watts[1] | 95 to 240VAC, 47/63HZ, ~300 Watts[2] |
| Category | Spin coater[1] | — |
| Wafer capacity | Up to 300mm wafers[1] | up to ø 300mm wafers[2] |
| Substrate capacity | 9 in × 9 in (229mm × 229mm) substrates[1] | 9" × 9" (229mm × 229mm) substrates[2] |
| Maximum rotational speed | — | 12,000 RPM (based on a ø 100mm silicon wafer)[2] |
| Configuration | — | Station mounted[2] |
| Speed basis | — | Based on a 100mm silicon wafer[2] |
| Process controller | — | 650-series process controller[2] |
| Processes supported | — | Coating, Etching, Developing, Rinsing-Drying and Cleaning[2] |
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