Waferpedia

Comparison ledger

H6-23versusWS-650-23

Laurell H6-23, Laurell WS-650-23, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
H6-23Laurell
WS-650-23Laurell
OEMLaurellLaurell
CategorySpin coaterSpin coater
Wafer size150mm150mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation650-series HL—
FamilyLaurell H6-23Laurell WS-650-23
Cited variants—
Specifications
Maximum rotational speed12,000 RPM (based on a ø 100mm silicon wafer)[3]12,000 RPM (based on a ø 100 mm silicon wafer)[1]
Wafer capacityUp to ø 150mm wafers[3]Up to ø 150 mm wafers[1]
Substrate capacity5" × 5" (127mm × 127mm) substrates[3]5" × 5" (127 mm × 127 mm) substrates[1]
Power95 to 240VAC, 47/63HZ, ~300 Watts[3]95 to 240VAC, 47/63HZ, ~300 Watts[1]
CategorySpin coater[3]—
Wafer sizeUp to 150 mm wafers[3]—
Substrate size5 in x 5 in (127 mm x 127 mm) substrates[3]—
Speed basisBased on a 100 mm silicon wafer[3]—
Series650-series HL coater system[3]—
Model—WS-650-23 B Spin Coater[1]
Mounting—Station Mounted[1]
Required N2 process/seal purge—60–70 PSIG (4–5 bar) of Nitrogen/CDA[1]
Vacuum—25–28 inches Hg; suggested flow volume 4.5 SCFM (0.127 cubic meters/minute) at 0 inches Hg[1]
Processes supported—Coating, Etching, Developing, Rinsing-Drying and Cleaning[1]
Maximum substrate size—150 mm wafers, 5" × 5" (127 mm × 127 mm) substrates[1]
Vacuum requirement—25–28 inches Hg (~635–711 mm Hg) with a flow volume of 4.5 SCFM (0.127 m³/min) at 0 inches Hg[1]
Seal/process purge gas—N₂ at 60–70 PSIG (4–5 bar)[1]
Gas consumption (standard motor)—3 cubic feet per hour (0.085 m³/hour)[1]
Gas consumption (high-performance motor)—20 cubic feet per hour (0.566 m³/hour)[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.org