Comparison ledger
Nikon NSR 2005 i 10 C i-Line, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | No wafer handler | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR 2005 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Handler Type | SiC Handling[1] | — |
| Configuration | Cassette Stage[1] | — |
| Handler Options | SiC Substrate[1] | — |
| OS Version | Nikon Nest[1] | — |
| CDA | N2[1] | — |
| DIW | Chilled Water[1] | — |
| Power | 208, 3 Phase[1] | — |
| Wafer size | No wafer handler[1] | — |
| Tool type | i-Line Stepper[1] | — |
| Cassette stage | Cassette Stage[1] | — |
| Wafer handling robot | Nikon Robot[1] | — |
| Wafer handling end-effector | Nikon End-Effecter[1] | — |
| Handler option | SiC Substrate[1] | — |
| Communication interface | GEM / SECS[1] | — |
| Vacuum | Vacuum[1] | — |
| Cables | All cables present[1] | — |
| Parts condition | No missing or damaged parts[1] | — |
| Unit condition (one listing) | Parts Tool - Not able to produce wafers as-is - Heavy water damage - No wafer handler[1] | — |
| Vintage (one listing) | 1994[1] | — |
| Vintage (another listing) | 1996[2] | — |
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