Comparison ledger
Oxford Instruments 100 ICP Fluorine, Oxford Instruments Plasmalab 100 ICP 180 RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 ICP FluorineOxford Instruments | Plasmalab 100 ICP 180 RIEOxford Instruments |
|---|---|---|
| OEM | Oxford Instruments | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments 100 ICP Fluorine | Oxford Instruments Plasmalab 100 |
| Specifications | ||
| Etch Gases | SF6, CF4, O2, Ar, N2, CHF3, C4F8[1] | — |
| Cryo DRIE etch rate | up to 5 µm/min[1] | — |
| Wafer size | 4 inch, 6 inch, 8 inch (with clamp change)[1] | 6 inch[2] |
| Voltage | — | 208V, 50/60Hz[2] |
| Configuration | — | With VAT PM-5 Adaptive Pressure Controller[2] |
| Manufacturer | — | Oxford Instruments[2] |
| Model | — | Plasmalab 100 ICP 180[2] |
| Tool type | — | Reactive Ion Etcher[2] |
| Category | — | Etch[3] |
| Power | — | 208V, 50/60Hz[2] |
| Adaptive pressure controller | — | VAT PM-5[2] |
| Turbopump controller | — | Adixen ACT 1300M[2] |
| Vacuum pump | — | Leybold D65BCS with oil filter and exhaust filter[2] |
| Gas delivery | — | Gas Box[2] |
| Control computer | — | Control Computer (no HDD)[2] |
| Monitor | — | LCD Monitor[2] |
| Chiller | — | Thermo Neslab Chiller[2] |
| Computer cart | — | Computer Cart[2] |
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