Comparison ledger
Oxford Instruments 100 ICP Fluorine, Tokyo Electron Tactras RLSA, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 ICP FluorineOxford Instruments | Tactras RLSATokyo Electron |
|---|---|---|
| OEM | Oxford Instruments | Tokyo Electron |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments 100 ICP Fluorine | Tokyo Electron Tactras RLSA |
| Specifications | ||
| Etch Gases | SF6, CF4, O2, Ar, N2, CHF3, C4F8[1] | — |
| Cryo DRIE etch rate | up to 5 µm/min[1] | — |
| Wafer size | 4 inch, 6 inch, 8 inch (with clamp change)[1] | — |
| Configuration | — | Oxide, Nitride, Polysilicon[2] |
| Chamber Type | — | Polysilicon Dry Etch Chamber[3] |
| Wafer Size | — | 300mm[4] |
| Microwave Generator | — | Nihon Koshuha Microwave Generator, Model MKS 050B04C-OSC-V[5] |
| Turbo Pump | — | SHIMADZU FT2301D[5] |
| Top Generator | — | MKS-050B04 PS-V[5] |
| Bottom Generator | — | Daihen RGA-20C[5] |
| Gas Box Configuration | — | N2, TSA, Ar, H2, NF3, SiH4[5] |
| Chuck | — | ESC with Dual He Cooling[5] |
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